TSMC, Samsung to use ASML High NA EUV tools for AI chips


ASML’s Assia Haddou reveals CNBC’s Katie Tarasov a Excessive NA chipmaking machine in Veldhoven, Netherlands, on April 24, 2025.

Magdalena Petrova

Samsung and TSMC, the world’s two largest chipmakers, have dedicated to utilizing ASML‘s Excessive NA excessive ultraviolet (EUV) lithography machines, as demand grows for extra superior chips.

ASML’s EUV lithography machines are essential instruments which might be used to print circuit patterns onto silicon wafers in the course of the chipmaking course of. The High NA machines can print smaller and extra intricate patterns. This software can value round $400 million.

Samsung, one of many world’s largest reminiscence chipmakers, mentioned it will use ASML’s machines to supply DRAM, a key sort of reminiscence, from 2028.

Samsung mentioned it will undertake the expertise in 2030, including that it will “prolong the DRAM scaling roadmap” and make the method extra environment friendly.

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ASML inventory over the past 12 months.

TSMC mentioned it will use ASML’s instruments for superior chips and expects use of Excessive NA machines to rise, “pushed primarily by the more and more advanced transistor architectures required for AI purposes.”

Traders see the success of Excessive NA EUV machines as key to ASML’s future development because the inventory appears to increase a 120% run over the past 12 months.

Barclays mentioned in a be aware on Tuesday that the bulletins “ought to present extra visibility on adoption which has been a key debate,” including that the information is “a optimistic.”

Shares of Amsterdam-listed ASML have been flat-to-lower in early buying and selling on Tuesday.

Samsung and TSMC be a part of Intel as clients for ASML’s Excessive NA machines. In July, ASML mentioned that Intel is utilizing the Excessive NA EUV expertise for superior chip manufacturing.

ASML has not given a current forecast on how lots of the machines it expects to promote however has mentioned that it’s going to add about 30% capability for EUV in whole in 2027.

The analysts at Barclays mentioned the bulletins give ASML extra visibility into planning.

“We see ASML with a big choice forward on whether or not to additional develop EUV capability than the lately expanded targets it has already given. Demand is clearly robust,” Barclays mentioned.

TSMC and Samsung may even be a part of ASML in an business initiative to advance next-generation 12-inch photmask expertise, upgrading from the present 6-inch format. A key a part of chip manufacturing, photomasks are successfully the stencils used to print the patterns on the wafers.

ASML mentioned the advantages of a bigger photomask embody higher productiveness and decrease chipmaking prices.

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